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Citation
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HERO ID
4659280
Reference Type
Journal Article
Title
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography
Author(s)
Borah, D; Cummins, C; Rasappa, S; Senthamaraikannan, R; Salaun, M; Zelsmann, M; Liontos, G; Ntetsikas, K; Avgeropoulos, A; Morris, MA
Year
2018
Volume
8
Issue
1
Language
English
PMID
29315245
DOI
10.3390/nano8010032
Web of Science Id
WOS:000424131600032
URL
http://
://MEDLINE:29315245
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Abstract
The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D₃). The number average molecular weight (Mn), polydispersity index (Mw/Mn) and PS volume fraction (φps) of the DBCP were MnPS = 23.0 kg mol-1, MnPDMS = 15.0 kg mol-1, Mw/Mn = 1.06 and φps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λL) and the width of the PDMS features (dL) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features.
Tags
IRIS
•
1,2-Dibromo-3-chloropropane
Litsearch 2018
Pubmed
WOS
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