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1278704 
Book/Book Chapter 
Advances in fabrication of X-ray masks based on vitreous carbon using a new UV sensitive positive resist - art. no. 679214 
Voigt, A; Kouba, J; Heinrich, M; Gruetzner, G; Scheunemann, HU; Rudolph, I; Waberski, C 
2008 
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) 
6792 
79214-79214 
UV sensitive photoresist; chemically amplified; X-ray mask; LIGA; UDXRL; vitreous carbon; adhesion; side wall striations