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1583583 
Journal Article 
Polycrystalline TiO2 Thin Films with Different Thicknesses Deposited on Unheated Substrates Using RF Magnetron Sputtering 
Wei, CHua; Chang, CMin 
2011 
1 
Materials Transactions
ISSN: 1345-9678 
52 
3 
554-559 
WOS:000290461000050 
Different film thicknesses of polycrystalline TiO2 thin
films deposited on various unheated substrates using radio frequency (RF) magnetron sputtering is
investigated. The crystalline structure, optical properties, and surface morphology and roughness
were measured using an X-ray diffractometer (XRD), a field-emission scanning electron microscope
(FESEM), an atomic force microscope (AFM). and a UV-Vis spectrophotometer. Polycrystalline phases
were formed on unheated substrates due to the plasma particle bombardment. Crystalline structures
more easily formed on the glass substrate and only nanocrystalline structures formed on the ITO
glass substrate due to the surface roughness of substrates. The absorption edge and optical band
gap depended on the crystalline particle size and phase structure. The XRD results indicate that
500-nm-thick film on a glass substrate had the strongest intensities of mixed anatase and rutile
phases. [doi:10.2320/matertrans.M2010358] 
titanium dioxide; film thickness; surface morphology; sputtering