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HERO ID
1586246
Reference Type
Journal Article
Title
Film morphology modification in ion-assisted glancing angle deposition
Author(s)
Sorge, JB; Brett, MJ
Year
2010
Is Peer Reviewed?
1
Journal
Thin Solid Films
ISSN:
0040-6090
EISSN:
1879-2731
Volume
519
Issue
4
Page Numbers
1356-1360
DOI
10.1016/j.tsf.2010.09.054
Web of Science Id
WOS:000285125300016
Abstract
Porous structured films grown with the glancing angle
deposition technique have been widely studied for thin film optical device applications. We
report the use of ion assistance to modify the structural and optical properties of porous
silicon dioxide and titanium dioxide columnar thin films grown at deposition angles of 70 degrees
and 85 degrees. Optical characterization studies show that tilted columnar structures will
undergo an increase in tilt angle and film density with increasing ion dose. These two trends
contrast with unassisted films where film density and column tilt angle are primarily controlled
by the deposition angle. Thus, a regime of film structures simultaneously exhibiting high film
density and large column tilt angle is enabled by incorporating an ion-assisted process. The
phisweep substrate motion algorithm for minimizing columnar anisotropy used in conjunction with
ion-assisted deposition provides additional control over film morphology and expands the utility
of this modified fabrication process. (C) 2010 Elsevier B.V. All rights reserved.
Keywords
Thin films; Optical properties; Titanium dioxide; Silicon dioxide
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