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1630503 
Journal Article 
Development and molecular-weight issues on the lithographic performance of poly (methyl methacrylate) 
Olzierski, A; Raptis, I 
2004 
1 
Microelectronic Engineering
ISSN: 0167-9317 
ELSEVIER SCIENCE BV 
AMSTERDAM 
73-4 
244-251 
English 
WOS:000222145400044 
The effect of methyl isobutyl ketone, MIBK:IPA, IPA:H2O
developers and the molecular-weight on the dissolution mechanism and on the overall lithographic
performance of poly (methyl methacrylate) (PMMA) was studied. PMMA sensitivity decreases
monotonically as MIBK relative concentration decreases. For isopropyl alcohol (IPA) concentration
in the 60-90% range (IPA:H2O solutions) the contrast and sensitivity values are very high and
almost similar. The lithographic performance was studied for selected developers (MIBK:IPA 1:3,
MIBK:IPA 1:1, IPA:H2O 7:3). The development front does not move smoothly in the standard
developer MIBK:IPA 1:3 as opposed to the other two cases. The sensitivity is the same for
MIBK:IPA 1:1, IPA:H2O 7:3, while the thickness loss in the second solution is limited. Overall,
the IPA:H2O 7:3 solution provides the highest process latitude, limited thickness loss of
unexposed regions and at the same time it is enviromnental friendlier. High M,, are less
susceptible to thickness loss of unexposed regions. Lithographic performance in the case of
MIBK:IPA developers does not depends significantly on M.. Combination of 996 K M, and IPA:H2O 7:3
offer the best lithographic performance. (C) 2004 Elsevier B.V. All rights reserved. 
poly (methyl methacrylate); electron beam lithography; development rate; dissolution rate monitor 
29th International Conference on Micro and Nano Engineering (MNE 2003) 
Cambridge, ENGLAND