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1707433 
Journal Article 
A new model of haze generation and storage-life-time estimation for mask - art. no. 660706 
Shimada, S; Kanda, N; Takahashi, N; Nakajima, H; Tanaka, H; Ishii, H; Shoji, Y; Ohtsuki, M; Naitoh, A; Hayashi, N 
2007 
Unk 
Proceedings of SPIE
ISSN: 0277-786X
EISSN: 1996-756X 
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) 
6607 
60706-60706 
WOS:000251348500006 
After quartz blanks with various sulfate ion amount on the surfaces were exposed by an ArF laser, growing defects, haze, on the surfaces were consequently counted by an inspection tool. As a result, the number of haze largely depends on the sulfate ion amount, and it is found that no haze is generated when the sulfate ion amount is smaller than a threshold value. A new haze generation model is provided to explain the threshold phenomenon. And then storage impact on increase of 14 the sulfate ion amount was investigated. The sulfate ion amount increases with storage time and airborne SOx concentration. From the results, the adsorption coefficient of an extended Langmuir equation was calculated, and the adsorption phenomenon was analyzed in detail. Simulation results show that it is recommended, regarding for storage environment, to keep under 0.01 ppbv airborne SOx concentration in order to prevent haze for one year. 
haze; ArF; mask; reticle; ammonium sulfate; storage; cleaning; life-time