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1754949 
Journal Article 
Catalytic Decomposition of PH3 on Heated Tungsten Wire Surfaces 
Umemoto, H; Nishihara, Y; Ishikawa, T; Yamamoto, S 
2012 
Yes 
Japanese Journal of Applied Physics
ISSN: 0021-4922
EISSN: 1347-4065 
51 
8 
WOS:000307992700045 
The catalytic decomposition processes of PH3 on heated
tungsten surfaces were studied to clarify the mechanisms governing phosphorus doping into silicon
substrates. Mass spectrometric measurements show that PH3 can be decomposed by more than 50% over
2000 K. H, P, PH, and PH2 radicals were identified by laser spectroscopic techniques. Absolute
density measurements of these radical species, as well as their PH3 flow rate dependence, show
that the major products on the catalyst surfaces are P and H atoms, while PH and PH2 are produced
in secondary processes in the gas phase. In other words, catalytic decomposition, unlike plasma
decomposition processes, can be a clean source of P atoms, which can be the only major dopant
precursors. In the presence of an excess amount of H-2, the apparent decomposition efficiency is
small. This can be explained by rapid cyclic reactions including decomposition, deposition, and
etching to reproduce PH3. (c) 2012 The Japan Society of Applied Physics