Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations | Health & Environmental Research Online (HERO)

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Citation
Tags

HERO ID

2022325

Reference Type

Journal Article

Title

Dependences of nitrogen incorporation behaviors on the crystallinity and phase distribution of atomic layer deposited Hf-silicate films with various Si concentrations

Author(s)

Park, TaeJoo; Kim, JH; Jang, JaeH; Na, KDuk; Hwang, CS; Yoo, JHo

Year

2008

Is Peer Reviewed?

Yes

Journal

Journal of Applied Physics
ISSN: 0021-8979
EISSN: 1089-7550

Volume

104

Issue

DOI

10.1063/1.2973674

Web of Science Id

WOS:000259853600087