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2031496 
Journal Article 
Structural studies of copper sulfide films: effect of ambient atmosphere 
Kundu, M; Hasegawa, T; Terabe, K; Yamamoto, K; Aono, M 
2008 
1 
Science and Technology of Advanced Materials
ISSN: 1468-6996
EISSN: 1878-5514 
9 
3 
035011 
English 
27878008 
WOS:000263654000015 
We examined the structural properties of copper sulfide films as a function of the sulfurization time of 70-nm-thick Cu films. Copper sulfide films with various phases such as mixed metallic Cu-chalcocite, chalcocite, roxbyite, and covellite phases were formed with increasing sulfurization time. To evaluate the structural stability of various films, all the films were exposed to the ambient atmosphere for the same amount of time. Although the phase structure and stoichiometry of the films were maintained at a greater depth, the near-surface region of the films was oxidized and covered with overlayers of oxide, hydroxide, and/or sulfate species due to the exposure and reaction with the ambient atmosphere. The oxygen uptake and its reactivity with the copper sulfide film surfaces were enhanced with increasing sulfur content of the films. In addition, the type of divalent state of copper formed on the film surfaces depended on the phase structure, composition, and stoichiometry of the films. 
copper sulfide; x-ray photoelectron spectroscopy; x-ray diffraction