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2800901 
Technical Report 
Preliminary Control Technology Survey on Comdial Semiconductor, Inc., Sunnyvale, California, Report No. CT-115-23a 
Mihlan, GJ; Willson, RD 
1983 
NIOSH/00132357 
S 
CT-115-23a 
115-123 
A preliminary control technology assessment survey was conducted at Comdial Semiconductor, Incorporated (SIC-3674) in Sunnyvale, California on January 12, 1982. Production areas, gas and chemical storage areas, waste storage areas, and wafer testing and assembly areas were surveyed. Chemical storage, gas handling, monitoring and ventilation systems, and the waste management system were assessed. Gas detector tubes were used for testing of gas cylinder leaks and ventilation system measurements were made by facility engineering personnel. No medical personnel were employed and physical examinations were not required. The authors recommend that the gas jungle for the diffusion furnace assembly be enclosed and vented and that manual shutoff valves be made accessible. The low pressure chemical vapor deposition source cabinet should be covered with a plastic shield to improve capture of gas leaks. Ventilation is needed for diffusion furnace source cabinets. Gas lines should be purged using nitrogen cylinders rather than house nitrogen. Lower phosphine (7803512) concentrations should be considered. A less toxic degreasing agent should be substituted for trichloroethylene (79016). The combustible gas detector should be routinely calibrated and a monitoring alarm system should be installed along with a phosphine monitoring system.