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4667847 
Journal Article 
Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning 
Luo, Y; Montarnal, D; Kirn, S; Shi, W; Barteau, KP; Pester, CW; Hustad, PD; Christianson, MD; Fredrickson, GH; Kramer, EJ; Hawker, CJ 
2015 
1 
Macromolecules
ISSN: 0024-9297
EISSN: 1520-5835 
48 
11 
3422-3430 
WOS:000356201100004 
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azidealkyne click cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. FloryHuggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (chi similar to 0.2 at 150 degrees C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (chi similar to 0.1 at 150 degrees C). Performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.