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5434019 
Journal Article 
Free radical dichlorovinylation of triethylsilane by thrichloroethylene 
Aloni, R; Rajbenbach, LA; Horowitz, A 
1979 
Yes 
Journal of Organometallic Chemistry
ISSN: 0022-328X
EISSN: 1872-8561 
171 
2 
155-166 
The free radical γ-radiation induced reactions in solutions of trichloroethylene in triethylsilane were investigated at 65° C. The main products, formed by a chain mechanism are cis- and trans-dichloroethylene, triethylchlorosilane, dichlorovinyltriethylsilane (Et3SiCHCCl2) and hydrogen chloride. The results are interpreted in terms of a mechanism in which Et3SiCl is formed by direct chlorine abstraction from C2Cl3H by the Et3Si• radical. Et3SiCHCCl2 is formed via a two step mechanism addition of an Et3Si• radical to C2Cl3H being followed by unimolecular chlorine elimination. Product distribution in the Et3SiH/C2Cl3H system and in competitive experiments in the presence of chloroform and 1-bromopentane was used for the estimation of relevant rate constants ratios.