Health & Environmental Research Online (HERO)


Print Feedback Export to File
5469640 
Book/Book Chapter 
Evaluation of organic contamination in cleanroom and deposition onto wafer surface 
Takeda, K; Nonaka, T; Sakamoto, Y; Taira, T; Hirono, K; Fujimoto, T; Suwa, N; Otsuka, K 
1998 
Institute of Environmental Sciences and Technology 
Mount Prospect, IL 
Institute of Environmental Sciences and Technology: 1998 proceedings: Contamination control 
556-561 
English 
WOS:000074492300081 
By using a newly constructed cleanroom,we have been investigating the behavior of the organic contamination in the cleanroom air during two years. The concentration of total organic contaminants in the cleanroom air gradually decreased with the passage of time, and after 6 months, it reached the constant value which is one-eighth of its initial value (780 mu g/m(3)). Low molecular-weight siloxanes (LMCSs) have been released continuously from materials such as solicone sealants during two years. We determined "sticking probability" of some organic compounds: the values of di-2-ethylhexyl phthalate (DOP), LMCSs and aromatic hydrocarbons were 2x10(-3), <1x10(-4), and <1x10(-5), respectively. The sticking probability of DOP was larger than those of particles(1)) and boron(2)). On the other hand, the substitution behavior of DOP for tris(chloroethyl) phosphate (TCEP) on silicon wafer surface was also observed. 
organic contamination; cleanroom air; wafer surface; siloxsans; phthalates; phosphates; trace analysis; gas chromatograph mass spectrometry; sticking probability 
9781877862625 
ICCCS 14th International Symposium on Contamination Control at the 44th Annual Technical Meeting of the Institute of Environmental Sciences and Technology 
Phoenix, AZ 
April 26-May 1, 1998