Open-air silicon etching by H-2-He-CH4 flowing cold plasma | Health & Environmental Research Online (HERO)

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HERO ID

6099737

Reference Type

Journal Article

Title

Open-air silicon etching by H-2-He-CH4 flowing cold plasma

Author(s)

Chaudhary, K; Inomata, K; Yoshimoto, M; Koinuma, H

Year

2003

Is Peer Reviewed?

Journal

Materials Letters
ISSN: 0167-577X
EISSN: 1873-4979

Volume

Issue

22-23

Page Numbers

3406-3411

DOI

Web of Science Id

WOS:000184050700019

Keywords

hydrogen; plasma; silicon; etching