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6195873 
Journal Article 
CVD diamond films: from growth to applications 
Achard, J; Gicquel, A; Hassouni, K; Silva, F 
2001 
Yes 
Current Applied Physics
ISSN: 1567-1739 
1 
6 
479-496 
WOS:000208321200008 
The present review provides an up-to-date report on the main potential of CVD diamond films for industrial applications as well as on recent basic research which seeks to understand diamond deposition microwave plasma reactors. This review includes firstly an overview of diamond film applications. Elements which explain variations in diamond film characteristics as a function of synthesis conditions are given. Also experimental results are reported which show variations in diamond characteristics (quality, microstructure, growth rate, growth mechanisms) as four plasma variables (pressure, power, percentage of methane, substrate temperature) are systematically changed. In the second part, we discuss the effects of these variables on local parameters such as electron temperature, gas temperature, carbon-containing species and H-atom densities. Finally, based on these results, relationships between key local parameters and diamond characteristics are established and discussed. 
CVD diamond; Applications; Growth mechanisms; Plasma modeling; Plasma diagnostics