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HERO ID
6211973
Reference Type
Journal Article
Title
Thin film deposition of Mo and Mo-compounds by PECVD from Mo(CO)6 and MoF6 as precursors: characterization of films and thermodynamic analysis
Author(s)
Di Giuseppe, G; Selman, JR
Year
2003
Is Peer Reviewed?
1
Journal
Journal of Electroanalytical Chemistry
ISSN:
1572-6657
EISSN:
1873-2569
Publisher
Elsevier
Volume
559
Issue
Elsevier
Page Numbers
31-43
DOI
10.1016/S0022-0728(03)00392-9
Web of Science Id
WOS:000186917900006
URL
http://www.sciencedirect.com/science/article/pii/S0022072803003929
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Abstract
Molybdenum hexacarbonyl, Mo(CO)6, and molybdenum hexafluoride, MoF6, have been used as precursors, with hydrogen or methane as reductants, to produce thin, dense and largely uniform layers of amorphous structure, on silicon (100) substrates. A plasma enhanced chemical vapor deposition (PECVD) setup was used for the deposition. XPS and AES analysis showed that Mo(CO)6 with CH4 produces a film containing a mixture of Mo compounds, mostly consisting of MoO2. Carbon appears to be present as Mo2C rather than elemental carbon, although the latter is thermodynamically favored. Similarly, Mo(CO)6 and H2 as the reactant mixture produce a film containing only one single, metastable compound, namely a Mo-oxycarbide. A mixture of MoF6 with hydrogen is capable of producing pure molybdenum deposits without fluorine surface contamination. With CH4 as the reductant, MoF6 is expected to produce a mixture of elemental Mo and Mo2C, while MoF6 with NH3 as the reductant is expected to yield predominantly Mo2N.
Keywords
Plasma enhanced chemical vapor deposition; Thermodynamics; Molybdenum; Thin film; X-ray photo-electron spectroscopy
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