Health & Environmental Research Online (HERO)


Print Feedback Export to File
6579959 
Journal Article 
A review of uses, environmental hazards and recovery/recycle technologies of perfluorocarbons (PFCs) emissions from the semiconductor manufacturing processes 
Tsai, WT; Chen, HP; Hsien, WY 
2002 
Yes 
Journal of Loss Prevention in the Process Industries
ISSN: 0950-4230 
ELSEVIER SCI LTD 
OXFORD 
15 
2 
65-75 
WOS:000173609100001 
Perfluorocarbons (PFCs) are being used as etching/cleaning gases in microelectronic or semiconductor manufacturing processes. These compounds under industrial uses mainly include CF4 (tetrafluorocarbon), C2F6 (hexafluoroethane), C3F8 (octafluoropropane), and cyclo-C4F8 or c-C4F8 (octafluorocyclobutane). From the globally environmental issues and regulatory points of view, it is urgent to control the emissions of these significant greenhouse gases from the industrial processes. This article reviews these PFCs in terms of physiochemical properties, industrial uses, and environmental hazards (e.g. global warming, and toxicity and exposure hazards). Further, it addresses some available recovery/recycle technologies (i.e. cryogenic condensation/distillation, pressure swing adsorption, and membrane separation) of process exhaust gases containing PFCs from semiconductor manufacturing processes in this review paper. (C) 2002 Elsevier Science Ltd. All rights reserved. 
perfluorocarbons (PFCs); property; environmental hazard; semiconductor manufacturing; recovery/recycle technology 
• PFAS Universe
     Data Source
          Web of Science
     Carbon tetrafluoride
     Octafluorocyclobutane
     Perfluoroethane
     Perflutren