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6588099 
Journal Article 
Relationship between thermal stabilty and optical bandgap of fluorinated amorphous carbon films 
Yang, SD; Ning, ZY; Huang, F; Cheng, SH; Ye, C; , 
2002 
1 
Wuli Xuebao
ISSN: 1000-3290 
CHINESE PHYSICAL SOC 
BEIJING 
51 
6 
1321-1325 
WOS:000176050800033 
Fluorinated amorphous carbon films were deposited using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) reactor with CF4 and C6H6 as source gas and were annealed in nitrogen ambience in order to investigate their thermal stability. The relative concentration of C=C bond and optical bandgap were obtained by Fourier transform infrared (FTIR) spectroscopy and Ultraviolet-Visible(UV-VIS) spectrum respectively. It demonstratesd that there is a close relationship between relative concentration of C=C bond and optical bandgap, and the films deposited at higher microwave power have a lower optical bandgap and better thermal stability. 
fluorinated amorphous carbon film; optical bandgap; annealing temperature; thermal stability 
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