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6588314 
Journal Article 
ANISOTROPIC ETCHING OF SIO2 IN LOW-FREQUENCY CF4/O2 AND NF3/AR PLASMAS 
Mcdowell, RS; Reisfeld, MJ; Galbraith, HW; Krohn, BJ; Flicker, H; Kennedy, RC; Aldridge, JP; Nereson, NG; Donnelly, VM; Flamm, DL; Dautremontsmith, WC; Werder, DJ; , 
1984 
Yes 
Journal of Applied Physics
ISSN: 0021-8979
EISSN: 1089-7550 
AMER INST PHYSICS 
WOODBURY 
55 
1 
242-252 
WOS:A1984RY25300036 
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