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6589215 
Journal Article 
MICROWAVE PLASMA-ETCHING OF SI WITH CF4 AND SF6 GAS 
Suzuki, K; Okudaira, S; Nishimatsu, S; Usami, K; Kanomata, I; , 
1982 
1 
Journal of Electrochemical Society
ISSN: 0013-4651
EISSN: 1945-7111 
ELECTROCHEMICAL SOC INC 
PENNINGTON 
129 
12 
2764-2769 
WOS:A1982PT93700025 
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