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Citation
Tags
HERO ID
6648638
Reference Type
Journal Article
Title
Use of the ASPEN Plus process simulator in modeling systems containing hydrofluoric acid
Author(s)
Basu, RS; Singh, RR; Smith, RA; ,
Year
2001
Is Peer Reviewed?
Yes
Journal
International Journal of Thermophysics
ISSN:
0195-928X
EISSN:
1572-9567
Publisher
KLUWER ACADEMIC/PLENUM PUBL
Location
NEW YORK
Volume
22
Issue
5
Page Numbers
1487-1496
DOI
10.1023/A:1012853306539
Web of Science Id
WOS:000172848200012
Abstract
Nonideal association in the vapor phase of HF poses a challenge in modeling. In this paper, a hybrid HF equation in the ASPEN Plus process simulation software and an equation of Anderko and co-workers are compared. Lencka and Anderko used a general framework to combine a simple association model with a cubic equation. This formulation helps to represent the phase behaviors of HF and halocarbon mixtures, especially for systems containing two liquid phases.
Keywords
ASPEN Plus process simulator; CFC-113a; dichlorodifluoromethane; equation of state; HCFC-22; HFC-134a; heat capacity; hydrofluoric acid; 1,1,1,2-tetrafluoroethane; 1,1,1-trichloro-2,2,2-trifluoroethane; vapor phase association; VLE
Conference Name
14th Symposium on Thermophysical Properties
Conference Location
BOULDER, COLORADO
Tags
PFAS
•
PFAS Universe
Data Source
Web of Science
Chlorodifluoromethane
1,1,1,2-Tetrafluoroethane
1,1,1-Trichloro-2,2,2-trifluoroethane
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