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6724115 
Journal Article 
WET CHEMICAL ETCHING OF SILICATE-GLASSES IN HYDROFLUORIC-ACID BASED SOLUTIONS 
Spierings, G; , 
1993 
Yes 
Journal of Materials Science
ISSN: 0022-2461
EISSN: 1573-4803 
SPRINGER 
NEW YORK 
6261-6273 
WOS:A1993ML89200002 
The etching of silicate glasses in aqueous hydrofluoric acid solutions is applied in many technological fields. In this review most of the aspects of the wet chemical etching process of silicate glasses are discussed. The mechanism of the dissolution reaction is governed by the adsorption of the two reactive species: HF and HF2- and the catalytic action of H+ ions, resulting in the breakage of the siloxane bonds in the silicate network. The etch rate is determined by the composition of the etchant as well as by the glass, although the mechanism of dissolution is not influenced. In the second part of this review, diverse applications of etching glass objects in technology are described. Etching Of SiO2 and doped SiO2 thin films, studied extensively for integrated circuit technology, is discussed separately.