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HERO ID
7030249
Reference Type
Journal Article
Title
Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation
Author(s)
Inayoshi, M; Ito, M; Hori, M; Goto, T; Hiramatsu, M; ,
Year
1999
Is Peer Reviewed?
1
Journal
Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures
ISSN:
1071-1023
Publisher
AMER INST PHYSICS
Location
WOODBURY
Page Numbers
949-956
Web of Science Id
WOS:000080853100008
Abstract
The development of a new fabrication technique of Teflon microparts using synchrotron radiation (SR) irradiation, the SR ablation process, was described. The anisotropic micromachining and thin film formation of polytetrafluoroethylene, fluorinated ethylene propylene, and perfluoroalkoxy were demonstrated using the SR ablation process. The anisotropic micromachining of Teflon with hole pattern of 2 mu m diam was successfully performed, and the micromachining of Teflon with a high aspect ratio of 50 was achieved. Moreover, Teflon films with flat surface were formed at a high rate by the SR ablation of Teflon at the substrate temperature above 200 degrees C. (C) 1999 American Vacuum Society.
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