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7030249 
Journal Article 
Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation 
Inayoshi, M; Ito, M; Hori, M; Goto, T; Hiramatsu, M; , 
1999 
Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures
ISSN: 1071-1023 
AMER INST PHYSICS 
WOODBURY 
949-956 
The development of a new fabrication technique of Teflon microparts using synchrotron radiation (SR) irradiation, the SR ablation process, was described. The anisotropic micromachining and thin film formation of polytetrafluoroethylene, fluorinated ethylene propylene, and perfluoroalkoxy were demonstrated using the SR ablation process. The anisotropic micromachining of Teflon with hole pattern of 2 mu m diam was successfully performed, and the micromachining of Teflon with a high aspect ratio of 50 was achieved. Moreover, Teflon films with flat surface were formed at a high rate by the SR ablation of Teflon at the substrate temperature above 200 degrees C. (C) 1999 American Vacuum Society.