Jump to main content
US EPA
United States Environmental Protection Agency
Search
Search
Main menu
Environmental Topics
Laws & Regulations
About EPA
Health & Environmental Research Online (HERO)
Contact Us
Print
Feedback
Export to File
Search:
This record has one attached file:
Add More Files
Attach File(s):
Display Name for File*:
Save
Citation
Tags
HERO ID
7048009
Reference Type
Journal Article
Title
Advanced Semiconductor Manufacturing Using Big Data
Author(s)
Tsuda, T; Inoue, S; Kayahara, A; Imai, SI; Tanaka, T; Sato, N; Yasuda, S; ,
Year
2015
Is Peer Reviewed?
Yes
Journal
IEEE Transactions on Semiconductor Manufacturing
ISSN:
0894-6507
EISSN:
1558-2345
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Location
PISCATAWAY
Page Numbers
229-235
DOI
10.1109/TSM.2015.2445320
Web of Science Id
WOS:000359231400006
Abstract
This paper describes the development and the actual utilization of fab-wide fault detection and classification (FDC) for the advanced semiconductor manufacturing using big data. In the fab-wide FDC, the collection of equipment's big data for the FDC judgment is required; hence, we developed the equipment monitoring system that handles the data in a superior method in high speed and in real time. We succeeded in stopping equipment and lots automatically when the equipment was detected as fault condition. In addition, we developed the environment that enables immediate data collection for analysis by the data aggregation and merging functions, which extracts keys correlating to yield from the equipment's parameter. Furthermore, we succeeded in development of the high-speed and high-accuracy process control system that implemented virtual metrology and the run-to-run function for the purpose to reduce process variation.
Tags
•
PFAS Universe
Data Source
Web of Science
Perflunafene
Home
Learn about HERO
Using HERO
Search HERO
Projects in HERO
Risk Assessment
Transparency & Integrity