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7848602 
Journal Article 
Facile deposition of porous fluorine doped tin oxide by Dr. Blade method for capacitive applications 
Asadzadeh, M; Tajabadi, F; Dastan, D; Sangpour, P; Shi, Z; Taghavinia, N 
2021 
1 
Ceramics International
ISSN: 0272-8842
EISSN: 1873-3956 
47 
4 
5487-5494 
WOS:000608687700004 
Three-dimensional macroporous fluorine-doped tin oxide (p-FTO) films were successfully deposited using commercial ink of FTO powder and SnCl2 salt via Dr. Blade method. Various features of p-FTO thin films were studied as a function of the ink composition and sintering temperature. The morphological studies corroborated formation of porous, uniform, and crack-free FTO films after annealing at 300 degrees C for 10 min in air. X-ray diffraction pattern demonstrated development of highly crystalline FTO films. The lowest sheet resistance of Omega/square was obtained for the p-FTO film with a thickness of 21 mu m. The capacitance of thin p-FTO films was investigated using a three-electrode system and the results illustrated that the p-FTO films had an ideal electric double-layer capacitive behavior over a wide range of scan rate potential. Electro-deposition of manganese oxide on porous FTO film surface enhanced the real capacitance from 5 to 36 mF/cm(2). 
Fluorine doped tin oxide ink; Porous conductive FTO film; Dr. blade method; Capacitor