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HERO ID
7857738
Reference Type
Journal Article
Title
Controlled physical properties and growth mechanism of manganese silicide nanorods
Author(s)
Hamzan, NB; Ng, CYiBin; Sadri, Rad; Lee, MinKai; Chang, LJ; Tripathi, M; Dalton, A; Goh, BT
Year
2021
Is Peer Reviewed?
Yes
Journal
Journal of Alloys and Compounds
ISSN:
0925-8388
Volume
851
DOI
10.1016/j.jallcom.2020.156693
Web of Science Id
WOS:000579868900017
Abstract
In this study, manganese silicide (Mn5Si3) nanorods grown on c-Si/SiO2 substrate by chemical vapor deposition were investigated in detail, where the reaction temperature was varied from 750 to 1, 000 degrees C. The Mn5Si3 nanorods were successfully grown at reaction temperatures above 750 degrees C. The growth of these Mn5Si3 nanorods was followed by a direct vapor transport process, which strongly dependent on the vapor pressure of the Mn precursor. Manganese silicide particles were used as the templates to initiate the growth of these nanorods. The results showed that increasing the reaction temperature increased the delivery of Mn vapor to the substrate surface. The magnetic properties of the Mn5Si3 nanorods were also investigated. The properties of the nanorods were influenced by the formation of Mn-rich silicide phase at higher reaction temperatures. The magnetic result indicated that the nanorods were mainly in ferromagnetic characteristic. The saturation magnetization values at 4 and 300 K were found to be higher at a reaction temperature of 950 degrees C, with a value of 0.70 and 0.03 emu/g, respectively. The maximum coercivity was obtained for the nanorods prepared at reaction temperature of 950 degrees C, with a value of 100 Oe. (C) 2020 Published by Elsevier B.V.
Keywords
Transition metal silicides; Manganese silicide; Nanorods; Chemical vapor deposition; Ferromagnetic
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