Model for transient enhanced diffusion of ion-implanted boron, arsenic, and phosphorous over wide range of process conditions | Health & Environmental Research Online (HERO)

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HERO ID

8084064

Reference Type

Journal Article

Title

Model for transient enhanced diffusion of ion-implanted boron, arsenic, and phosphorous over wide range of process conditions

Author(s)

Suzuki, K

Year

2003

Is Peer Reviewed?

Yes

Journal

Fujitsu Scientific & Technical Journal
ISSN: 0016-2523

Volume

Issue

Page Numbers

138-149

Web of Science Id

WOS:000184533100016