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8213163 
Journal Article 
Ionisation and dissociation of carbonyl fluoride and trifluoromethyl hypofluorite by electron impact 
Thynne, JCJ; Macneil, KAG 
1970 
0 
International Journal of Mass Spectrometry and Ion Physics
ISSN: 0020-7381 
5 
1-2 
95-111 
English 
Positive and negative ion formation as the result of the electron bombardment of carbonyl fluoride and trifluoromethyl hypofluorite have been investigated. A value of 4.7±0.2 eV has been measured for the CF3OF bond strength in trifluoromethyl hypofluorite and the electron affinities of the trifluoromethyl and trifluoromethoxyl radicals have been estimated to be 1.8±0.2 eV and 1.9±0.1 eV respectively. The OF- ion has been observed which implies that E(OF) ≥ 1.4±0.5 eV. © 1970.