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8391722 
Meetings & Symposia 
Photoinsolubilization and interfacial phenomena in trilayers of poly(phenylsilsesquioxane), poly(vinylalcohol), and an acid-generating photoresist 
Sheats, JR 
1992 
Publ by ACS 
San Francisco, CA, USA 
Proceedings of the American Chemical Society Spring Meeting 
66 
English 
In the course of our work on the Photochemical Image Enhancement (PIE) system in which the oxygen-dependent photobleaching of anthracene provides a high efficiency photomask for pattern transfer to an underlying deep-UV photoresist, we observed some remarkable behavior associated with the photoreactions of a commercially available acid-generating resist, SAL-601 from Shipley Co. These phenomena are intrinsically interesting, and may shed some light on other interfacial problems that occasionally arise in multilayer resist systems. This article discusses these phenomena.