Reaction of gallium arsenide with concentrated acids: formation of arsine

Scott, N; Carter, DE; Fernando, Q

HERO ID

1032533

Reference Type

Journal Article

Year

1989

Language

English

PMID

2756869

HERO ID 1032533
In Press No
Year 1989
Title Reaction of gallium arsenide with concentrated acids: formation of arsine
Authors Scott, N; Carter, DE; Fernando, Q
Journal American Industrial Hygiene Association Journal
Volume 50
Issue 7
Page Numbers 379-381
Abstract Crystalline particles of gallium arsenide (GaAs) (approximately 2 microns in diameter) react with concentrated hydrochloric acid (HCl) (11.6 to 9 M) to form highly toxic arsine (AsH3) gas. None of the other strong acids that were investigated reacted with gallium arsenide to form AsH3. A spectrophotometric method, based on the reaction of AsH3 with silver diethyldithiocarbamate in a chloroform solution containing morpholine, was used to detect AsH3 gas dissolved in aqueous solutions and to determine the AsH3 gas that was liberated by the reaction of GaAs with HCl. Active sites on the gallium arsenide surface initiate the reaction that forms AsH3 gas. Absorption of oxygen or ions from solution on these active sites inhibits the formation of AsH3.
Doi 10.1080/15298668991374831
Pmid 2756869
Wosid WOS:A1989AE48700008
Is Certified Translation No
Dupe Override No
Comments |WOS:A1989AE48700008
Is Public Yes
Language Text English
Keyword <?xml version="1.0" encoding="UTF-8"?><kw>DCN-184640</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Analytical methods</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Chemical analysis</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Analytical chemistry</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Semiconductors</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Electronics industry</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Toxic gases</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Gas detectors</kw>; <?xml version="1.0" encoding="UTF-8"?><kw>Gas sampling</kw>
Is Qa No