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4249852 
Journal Article 
Stoichiometry of Nickel Oxide Films Prepared by ALD 
Bachmann, J; Zolotaryov, A; Albrecht, Ole; Goetze, S; Berger, A; Hesse, D; Novikov, D; Nielsch, K 
2011 
Yes 
Chemical Vapor Deposition
ISSN: 0948-1907 
17 
7-9 
177-+ 
WOS:000295230400001 
Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.